Dendrimer-mediated growth of very flat ultrathin Au films
作者： A Rar , J.N Zhou , W.J Liu , J.A Barnard , A Bennett
DOI: 10.1016/S0169-4332(01)00055-1
关键词: Thin film 、 X-ray reflectivity 、 Materials science 、 Chemical engineering 、 Crystallography 、 Dendrimer 、 X-ray photoelectron spectroscopy 、 Oxide 、 Nanoindentation 、 Surface roughness 、 Monolayer
摘要: Abstract Si wafers covered with a native oxide were used as substrates for growth of 12.5 nm evaporated Au (Au/SiO x ), and self-assembly dendrimer monolayer followed by the same thickness (Au/dendrimer/SiO ). This paper presents evidence very significant improvements in film quality when grown on self-assembled amine-terminated poly(amidoamine) (PAMAM) dendrimers (generation G8) SiO . An increase surface hardness from 1.7 to 3 GPa, decrease roughness about 1.2 0.4 nm better adhesion are shown combination XPS, X-ray reflectivity (XRR), AFM, nanoindentation. The improvement may be explained penetration deposited into adlayer. interpenetration is confirmed AFM profilometry XPS analysis.
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