Crystalline multiple-nanosheet III-V channel FETs

作者: Borna J. Obradovic , Mark. S. Rodder , Jorge A. Kittl

DOI:

关键词: OptoelectronicsMaterials scienceGate oxideElectrical engineeringNanosheetLayer (electronics)Metal gateCrystalline semiconductorGate dielectricCommunication channelField-effect transistor

摘要: A field effect transistor includes a body layer comprising crystalline semiconductor channel region therein, and gate stack on the region. The layer, dielectric between Related devices fabrication methods are also discussed.

参考文章(65)
Marko Radosavljevic, Gilbert Dewey, Niloy Mukherjee, Benjamin Chu-Kung, High indium content transistor channels ,(2010)
Renrong Liang, Ning Cui, Jing Wang, Jun Xu, Tunneling field effect transistor and method for forming the same ,(2011)
Huang Qianqian, Wang Yangyuan, Zhan Zhan, Huang Ru, Field effect transistor of hybrid conduction mechanism ,(2013)
Ali Khakifirooz, Bruce B. Doris, Kangguo Cheng, Isaac Lauer, Ghavam G. Shahidi, Wilfried E. Haensch, Tunnel field effect transistor ,(2012)
Kazuhiro Nagase, Ichiro Shibasaki, Field effect transistor ,(1992)
Po-Chao Tsao, Cheng-Guo Chen, Ssu-I Fu, Chien-Ting Lin, Chung-Fu Chang, Yu-Hsiang Hung, Finfet and method for fabricating the same ,(2013)
Shin-Yeh Huang, Shu-Tine Yang, Chu-Yun Fu, Hung-Ming Chen, Hung-Ta Lin, Finfet and method of fabricating the same ,(2010)
Fumihiko Toda, Isao Tamai, Shinichi Hoshi, Heterojunction field effect transistor ,(2009)
Paolo Menegoli, Fabio Alessio Marino, High performance multigate transistor ,(2011)
Peter G. Tolchinsky, Marko Radosavljevic, Robert S. Chau, Niloy Mukherjee, Mark R. Lemay, James M. Powers, Niti Goel, Benjamin Chu-King, Loren Chow, Van H. Le, Jack T. Kavalieros, Matthew V. Metz, Methods of forming hetero-layers with reduced surface roughness and bulk defect density on non-native surfaces and the structures formed thereby ,(2011)