Compound semiconductor substrate grown on metal layer, method for manufacturing the same, and compound semiconductor device using the same

作者: Dong-Kun Lee , Doo-Soo Kim , Ho-Jun Lee , Yong-jin Kim

DOI:

关键词: Light emitting deviceElectrodeMetalPower consumptionCompound semiconductorSubstrate (printing)OptoelectronicsLayer (electronics)EpitaxyMaterials science

摘要: The present invention relates to a compound semiconductor substrate and method for manufacturing the same. provides which coats spherical balls on substrate, forms metal layer between balls, removes form openings, grows from openings. According invention, can be simplified grow high quality rapidly, simply inexpensively, as compared with conventional ELO (Epitaxial Lateral Overgrowth) or forming layer. And, serves one electrode of light emitting device reflecting film provide having reduced power consumption efficiency.

参考文章(27)
Surya Ganti, Fazila Seker, Pradeep Sharma, Judith Stein, Azar Alizadeh, Loucas Tsakalakos, Patrick Malenfant, John Reitz, William Huber, Methods of defect reduction in wide bandgap thin films using nanolithography ,(2002)
Tatau Nishinaga, ELO semiconductor substrate ,(1999)
Jeffrey King, Christopher J. Summers, Zhong L. Wang, Xudong Wang, Elton D. Graugnard, Large scale patterned growth of aligned one-dimensional nanostructures ,(2008)
Tsuyoshi Oyaizu, Takeo Ito, Satoshi Koide, Hitoshi Tabata, Takashi Nishimura, Image display unit and production method therefor ,(2002)
Shinichi Takigawa, Masahiro Ogawa, Satoshi Tamura, Masahiro Ishida, Method for fabricating group III nitride semiconductor substrate ,(2002)