作者: Maciej Psarski , Daniel Pawlak , Jarosław Grobelny , Grzegorz Celichowski
DOI: 10.1080/01694243.2015.1048131
关键词: Epoxy 、 Fluoropolymer 、 Contact angle 、 Nanocomposite 、 Polymer chemistry 、 Perfluorohexane 、 Silanization 、 Materials science 、 Plasma polymerization 、 Monomer
摘要: Fluoropolymer films were deposited on silicon (1 0 0) wafers, glass, epoxy, and hierarchical dual-sized filler epoxy composite surfaces by plasma polymerization of perfluorohexane, perfluoro(2-methylpent-2-ene), perfluoro(4-methylpent-2-ene). The procedure involved continuous wave plasma-enhanced deposition, followed a discharge-off period, with the monomer gas feed maintained. Silanization wafers glass triethoxyvinylsilane was employed to improve fluoropolymer bonding these substrates. presence double bonds in perfluoro(2-methylpent-2-ene) perfluoro(4-methylpent-2-ene) found influence coating topography, thereby increasing surface roughness modified All fluorocarbons provided similar level hydrophobization flat substrates, exhibited water contact angles (WCA) about 110°. Hydrophobization nanocomposite superhydrophobic surface...