Effects of Annealing and Doping on Nanostructured Bismuth Telluride Thick Films

作者: Shanghua Li , Hesham MA Soliman , Jian Zhou , Muhammet S Toprak , Mamoun Muhammed

DOI: 10.1021/CM800696H

关键词: MetallurgyFigure of meritBismuth tellurideAnnealing (metallurgy)Thermoelectric effectMaterials scienceOptoelectronicsDoping

摘要: Bismuth telluride is the state-of-the-art thermoelectric (TE) material for cooling applications with a figure of merit ∼1 at 300 K. There need development TE materials based on t ...

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