Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
作者： Katsuhiro Kobayashi , Takeru Watanabe , Youichi Ohsawa , Takeshi Kinsho
DOI:
关键词: Photoacid 、 Ammonium 、 Sulfonate 、 Resist 、 Ion 、 Tetramethylammonium 、 Onium 、 Oxime 、 Polymer chemistry 、 Chemistry
摘要: Sulfonate salts have the formula: HOCH 2 CH CF SO 3 − M + wherein is a Li, Na, K, ammonium or tetramethylammonium ion. Onium salts, oxime sulfonates and sulfonyloxyimides derived from these are effective photoacid generators in chemically amplified resist compositions.
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