作者: S.S. Chen , Z.Z. Ye , H.H. Zhang , X.H. Pan , P. Ding
DOI: 10.1016/J.APSUSC.2013.04.071
关键词: Materials science 、 Sapphire 、 Molecular beam epitaxy 、 Transmission electron microscopy 、 Epitaxy 、 Crystallography 、 Band gap 、 Dislocation 、 Luminescence 、 Reflection (mathematics)
摘要: Abstract We report the growth and characterization of single-crystalline, epitaxial Zn 0.9 Mg 0.1 O films on c-plane sapphire substrates with MgO buffer layer by plasma-assisted molecular beam epitaxy. The quality epilayers is evidenced a Hall mobility more than 60 cm 2 V −1 s at room temperature an X-ray diffraction (XRD) rocking curve full-width half-maximum 47 arcsec for (0 0 0 2) reflection. A screw dislocation density 4 × 10 6 cm −2 estimated XRD. Transmission electron microscopy revealed that thickness about 3.5 nm, highly c -axis oriented reflection corresponding to wurtzite-phase observed. Alloying found widen bandgap energy ZnO, luminescence observed 3.502 eV low temperature.