Reactivity at line defects in antimony in etchants with dextro- and levo tartaric acid
作者： Amit H. Raval , Mihir J. Joshi , B. S. Shah
关键词: Antimony 、 Line defects 、 Tartaric acid 、 Nitric acid 、 Inorganic chemistry 、 Aqueous solution 、 Chemistry
摘要: The (111) cleavage faces of antimony single crystals were etched in aqueous mixtures fuming nitric acid plus dextro tartaric and levo acid. Triangular, crystallographically oriented etch pits observed at sites dislocations. activation energies for lateral motion ledges the frequency factors calculated both types etchants which found to be higher containing than etchants. results are explained terms complexes difference shape molecular structures.
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