Isolated arsenic-antisite defect in GaAs and the properties of EL2.

作者: Jaroslaw Dabrowski , Matthias Scheffler

DOI: 10.1103/PHYSREVB.40.10391

关键词: Electronic structureInorganic compoundArsenicLocal-density approximationElectron densityInfrared spectroscopyMaterials scienceJahn–Teller effectGround stateCondensed matter physics

摘要: … This force constant is similar to that of the other deep defects in semiconductors … The moderateoutwards breathing relaxation of the Aso, antisite of about 4%, found in our calculations, …

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