IR laser-induced co-decomposition of gaseous trisilane and carbon disulfide
作者： Josef Pola , Dana Pokorná , Jan Šubrt , Panos Papagiannakopoulos
DOI: 10.1016/J.JAAP.2007.11.009
关键词: Fourier transform infrared spectroscopy 、 Trisilane 、 Carbon disulfide 、 Decomposition 、 Chemical vapor deposition 、 Photochemistry 、 Moisture 、 Organic chemistry 、 Chemistry 、 Pyrolysis 、 Irradiation
摘要: Abstract A TEA CO 2 laser irradiation of gaseous mixtures trisilane and carbon disulfide results in the decomposition both compounds chemical vapor deposition solid Si/S/C/H polymeric films. The GCMS identification volatile products FTIR spectral EDX-SEM analysis allowed recognition reaction silylenes with S atoms as a major route between each edduct. films are blend carbonaceous polysilthiane structures that respectively possess low content C–S–C bonds high Si–S–Si bonds. react air moisture, evolve H develop to polysiloxanes become part nanostructured thiocarbosiloxanes
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