Bolometric arrays and infrared sensitivity of VO2 films with varying stoichiometry

摘要: Here we propose a linear microbolometric array based on VOx thin films. The is fabricated by using micromachining technology, and its thermo-sensitive film has excellent infrared response spectrum TCR characteristics. Nano-scale films deposited SiO2/Si substrates were obtained e-beam vapor deposition. then annealed at temperatures between 300 to 500 C with various deposition duration time. crystal structures microstructures examined XRD, SEM ESCA. These showed predominant phase of rhombohedral VO2 the crystallinity increased as annealing temperature increased. Integrated CMOS circuit, an experimentally prototypical monolithic designed fabricated. testing results experimental show that responsivity can approach 18KV/W potential for image systems.