Effect of nitrogen flow rate on the properties of TiN film deposited by e beam evaporation technique
作者： Nishat Arshi , Junqing Lu , Bon Heun Koo , Chan Gyu Lee , Faheem Ahmed
DOI: 10.1016/J.APSUSC.2012.04.179
关键词: Tin 、 Titanium nitride 、 Analytical chemistry 、 X-ray photoelectron spectroscopy 、 Electrical resistivity and conductivity 、 Materials science 、 Diffraction 、 Electron beam processing 、 Cubic centimetre 、 Grain size
摘要: … Electron beam evaporation is a very important and promising … TiN using electron beam evaporation has advantages such … were deposited by the e beam evaporation technique in 100% …
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