Release surfaces, particularly for use in nanoimprint lithography

摘要: The addition of thin coatings (less than and approaching monomolecular coatings) persistent release materials comprising preferred compounds the formula: RELEASE-M(X) n−1 — n−m−1 Q m , or RELEASE-M(OR) —, wherein RELEASE is a molecular chain from 4 to 20 atoms in length, preferably 6 16 which molecule has either polar non-polar properties; M metal atom, semiconductor semimetal atom; X halogen cyano, especially Cl, F, Br; hydrogen alkyl group; number groups; R hydrogen, phenyl, 1 carbon atoms; and; n valence −1 M, at least provides good properties. coated substrates are particularly for lithographic method apparatus creating ultra-fine (sub-25 nm) patterns film on substrate provided, mold having one protruding feature pressed into carried substrate. creates recess film. removed then processed such that exposing underlying Thus, replaced film, completing lithography. will be, subsequent processes, reproduced another material added onto