Study of the thermal treatment of SiO2 aggregate
作者： N Tahiri , L Khouchaf , M Elaatmani , G Louarn , A Zegzouti
DOI: 10.1088/1757-899X/62/1/012002
关键词: Attenuated total reflection 、 Fourier transform 、 Reactivity (chemistry) 、 Full width at half maximum 、 Diffraction 、 Materials science 、 Thermal treatment 、 Crystallinity 、 Quality (physics) 、 Analytical chemistry
摘要: Crystalline quality and the silanoles defects (Si-OH) present within structure of natural SiO2 play an important role in its reactivity. In this work, relationship between loss crystallinity improvement upon heating 450 °C 650 was shown using X-Ray Diffraction (XRD) Fourier Transform mid Infrared Spectroscopy Attenuated Total Reflection (ATR). A shift principal band Si-O-Si from 1078 cm−1 to 1082 decrease intensity Si-OH bands at 555cm−1and 950cm−1 were shown. The reduction is correlated silanoles. agreement with FT-IR results, FWHM XRD peaks shows that crystalline improved heating. This result leads a reactivity aggregate under chemical attacks.
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