Farbication of UV photodetector from nickel oxide nanoparticles deposited on silicon substrate by closed-field unbalanced dual magnetron sputtering techniques

作者: Oday A. Hammadi , Mohammed K. Khalaf , Firas J. Kadhim

DOI: 10.1007/S11082-015-0247-6

关键词: SiliconSubstrate (electronics)OptoelectronicsNanostructurePhotodetectorNickel oxideNanoparticleQuantum efficiencySputter depositionMaterials science

摘要: In this work, a UV photodetector was fabricated by depositing 25 nm nickel oxide nanoparticles on an n-type silicon substrate closed-field unbalanced dual magnetron sputtering technique. The showed maximum spectral responsivity of 4.8 mA/W at 318 with quantum efficiency 1.87 %. This is good attempt to produce such nanostructures high quality and low cost for detection application.

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