Etching on polar (111) surfaces of CdTe crystals studied with Auger electron spectroscopy
作者： Y.‐C. Lu , C. M. Stahle , R. S. Feigelson , J. Morimoto
DOI: 10.1063/1.339033
关键词: Oxidizing agent 、 Hydrogen 、 Stoichiometry 、 Tellurium 、 Analytical chemistry 、 Single crystal 、 Electron spectroscopy 、 Auger electron spectroscopy 、 Isotropic etching 、 Chemistry
摘要: Various reducing and oxidizing etches were applied to the polar (111)Cd (111)Te surfaces of CdTe crystals. The induced surface layers studied with Auger electron spectroscopy, chemical reactions involved discussed. A dithionite etch left both (111) Cd rich. sulfur in solution appeared replace Te near surface. hydrazine ratio about one on surfaces. large oxygen peak was observed increase as etching time temperature increased, indicating that not reducing. Hydrogen heat treatment stoichiometric, free contamination crystalline. best method we have tried retain stoichiometry (111)CdTe treated EAg‐1 rich, strong correlation between relative concentration Ag suggested a reaction Ag. Te(NOO)/Te(MNN) surf...
scitation.org
harvard.edu
aip.org 
sci-hub.se 参考文章(16)
R. D. Feldman, R. L. Opila, P. M. Bridenbaugh, Auger electron spectroscopic study of the etching of cadmium telluride and cadmium manganese telluride Journal of Vacuum Science and Technology. ,vol. 3, pp. 1988- 1991 ,(1985) , 10.1116/1.572912
P. M. Amirtharaj, Fred H. Pollak, Raman scattering study of the properties and removal of excess Te on CdTe surfaces Applied Physics Letters. ,vol. 45, pp. 789- 791 ,(1984) , 10.1063/1.95367
Susan Mroczkowski, David Lichtman, Calculated Auger yields and sensitivity factors for KLL–NOO transitions with 1–10 kV primary beams Journal of Vacuum Science and Technology. ,vol. 3, pp. 1860- 1865 ,(1985) , 10.1116/1.572933
M. Hage-Ali, R. Stuck, AN Saxena, P. Siffert, Studies of CdTe surfaces with secondary ion mass spectrometry, rutherford backscattering and ellipsometry Applied physics. ,vol. 19, pp. 25- 33 ,(1979) , 10.1007/BF00900533
Antonio J. Ricco, Henry S. White, Mark S. Wrighton, X‐ray photoelectron and Auger electron spectroscopic study of the CdTe surface resulting from various surface pretreatments: Correlation of photoelectrochemical and capacitance‐potential behavior with surface chemical composition Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 2, pp. 910- 915 ,(1984) , 10.1116/1.572547
F. A. Ponce, R. Sinclair, R. H. Bube, Native tellurium dioxide layer on cadmium telluride: A high‐resolution electron microscopy study Applied Physics Letters. ,vol. 39, pp. 951- 953 ,(1981) , 10.1063/1.92623
Y.‐C. Lu, R. K. Route, D. Elwell, R. S. Feigelson, Etch pit studies in CdTe crystals Journal of Vacuum Science and Technology. ,vol. 3, pp. 264- 270 ,(1985) , 10.1116/1.573214
S. Sivananthan, X. Chu, J. Reno, J. P. Faurie, Relation between crystallographic orientation and the condensation coefficients of Hg, Cd, and Te during molecular‐beam‐epitaxial growth of Hg1−xCdxTe and CdTe Journal of Applied Physics. ,vol. 60, pp. 1359- 1363 ,(1986) , 10.1063/1.337310
M H Patterson, R H Williams, Surface layers on cadmium telluride Journal of Physics D. ,vol. 11, ,(1978) , 10.1088/0022-3727/11/5/003
U. Solzbach, H.J. Richter, Sputter cleaning and dry oxidation of CdTe, HgTe, and Hg0.8Cd0.2Te surfaces Surface Science. ,vol. 97, pp. 191- 205 ,(1980) , 10.1016/0039-6028(80)90113-2