Principles of Chemical Vapor Deposition

摘要: Acknowledgements. Preface. 1: Introduction. 1. What's behind the facade? 2. Generic reactors and process considerations. 3. Tube showerhead reactor examples. 2: Reactors without transport. What goes in must go somewhere: Measuring gases. Review: Kinetic theory. The zero-dimensional reactor. 4. Zero-dimensional tube 3: Mass Introduction to Convection diffusion. Diffusion: Physics math. Fluid flow convective 5. When flows matter: Knudsen number. 6. 7. On photons. 4: Heat is heat (energy) transport? conduction Convective transfer made (very) simple. Natural convection. Radiative transfer. Temperature measurement. 5: Chemistry for CVD. does C stand anyway? Volatility, V Equilibrium: Where things are going. Kinetics: slowest step wins. Real precursors real films. example. A few final remarks. 6: Gas discharge plasmas Plasma discharges: An instant review. low-pressure cold-plasma state. Key parameters capacitive plasma Alternative excitation methods. Plasmas deposition. damage. Technical details. 8. Ongoing example: Parallel plate 9. remark on computational tools. 7: CVD Why CVD? Silicon dioxide. nitride. Tantalum pentoxide. Metal deposition by Concluding 8: reactors. configurations. Showerhead High density Injector-based atmospheric pressure Reactor conclusions. Index.