Contribution of ionic precursors to deposition rate of a-Si:H films fabricated by plasma CVD
作者： S Toko , Y Hashimoto , Y Kanemitu , Y Torigoe , H Seo
DOI: 10.1088/1742-6596/518/1/012008
关键词: Deposition rate 、 Analytical chemistry 、 Voltage 、 Plasma 、 Ionic bonding 、 Negative bias 、 Materials science 、 DC bias 、 Downstream Region
摘要: We have studied contribution of ionic precursors to deposition rate a-Si:H films in the downstream region a multi-hollow discharge plasma CVD reactor using DC bias grid and QCMs. The decreases from 1.1 0.93 by applying negative voltage grid. contribute 7% total dominant are considered be negatively charged clusters.
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Shinya Iwashita, Giichiro Uchida, Julian Schulze, Edmund Schüngel, Peter Hartmann, Masaharu Shiratani, Zoltán Donkó, Uwe Czarnetzki, Sheath-to-sheath transport of dust particles in a capacitively coupled discharge Plasma Sources Science and Technology. ,vol. 21, pp. 032001- ,(2012) , 10.1088/0963-0252/21/3/032001
Kazunori Koga, Toshihisa Inoue, Kouki Bando, Shinya Iwashita, Masaharu Shiratani, Yukio Watanabe, Highly stable a-Si:H films deposited by using multi-hollow plasma chemical vapor deposition Japanese Journal of Applied Physics. ,vol. 44, ,(2005) , 10.1143/JJAP.44.L1430
A. Terakawa, Review of thin-film silicon deposition techniques for high-efficiency solar cells developed at Panasonic/Sanyo Solar Energy Materials and Solar Cells. ,vol. 119, pp. 204- 208 ,(2013) , 10.1016/J.SOLMAT.2013.06.044
Kazunobu Tanaka, Photo-induced metastability in amorphous semiconductors Journal of Non-crystalline Solids. pp. 1- 10 ,(1991) , 10.1016/S0022-3093(05)80044-4
Masako Shindo, Satoshi Uchino, Ryuta Ichiki, Shinji Yoshimura, Yoshinobu Kawai, Measurements of the negative ion density in SF6/Ar plasma using a plane electrostatic probe Review of Scientific Instruments. ,vol. 72, pp. 2288- 2293 ,(2001) , 10.1063/1.1366631
W. J. Nellis, S. Legvold, Resistivity Anomalies in Gadolinium Journal of Applied Physics. ,vol. 40, pp. 2267- 2269 ,(1969) , 10.1063/1.1657969
Kazunori Koga, Yasuhiro Matsuoka, Kenichi Tanaka, Masaharu Shiratani, Yukio Watanabe, In situ observation of nucleation and subsequent growth of clusters in silane radio frequency discharges Applied Physics Letters. ,vol. 77, pp. 196- 198 ,(2000) , 10.1063/1.126922
Sinae Kim, Shunsuke Kasashima, Porponth Sichanugrist, Taizo Kobayashi, Tokio Nakada, Makoto Konagai, Development of thin-film solar cells using solar spectrum splitting technique Solar Energy Materials and Solar Cells. ,vol. 119, pp. 214- 218 ,(2013) , 10.1016/J.SOLMAT.2013.07.011
William Makoto Nakamura, Hidefumi Matsuzaki, Hiroshi Sato, Yuuki Kawashima, Kazunori Koga, Masaharu Shiratani, High rate deposition of highly stable a-Si:H films using multi-hollow discharges for thin films solar cells Surface & Coatings Technology. ,vol. 205, ,(2010) , 10.1016/J.SURFCOAT.2010.07.081
Y P Song, D Field, D F Klemperer, Electrical potentials in RF discharges Journal of Physics D. ,vol. 23, pp. 673- 681 ,(1990) , 10.1088/0022-3727/23/6/006