ELECTROSTATIC (LANGMUIR) PROBE MEASUREMENTS IN RF DRIVEN He, N2, BCl3, AND BCl3/N2 PLASMAS
作者： Bogdan Amaru Pathak
DOI:
关键词: Plasma 、 Nanotechnology 、 Etching (microfabrication) 、 BCL3 、 Langmuir probe 、 Chemistry
摘要:
参考文章(36)
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