Particle scale modeling of material removal and surface roughness in chemical mechanical polishing
作者： Suresh Babu Yeruva
DOI:
关键词: Analytical chemistry 、 Surface roughness 、 Particle 、 Materials science 、 Chemical-mechanical planarization 、 Scale model 、 Material removal 、 Composite material
摘要:
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ufl.edu 参考文章(98)
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