Near-infrared double negative metamaterials
作者： Shuang Zhang , Wenjun Fan , K. J. Malloy , S.R. J. Brueck , N. C. Panoiu
关键词: Refractive index 、 Optics 、 Thin film 、 Materials science 、 Refraction 、 Negative refraction 、 Semiconductor 、 Parametric statistics 、 Dispersion (optics) 、 Metamaterial
摘要: We numerically demonstrate a metamaterial with both negative e and µ over an overlapping near-infrared wavelength range resulting in low loss negative-index material. Parametric studies optimizing this index are presented. This structure can be easily fabricated standard semiconductor processing techniques.
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