Method for making an Al2O3 film
作者： Akira Nomoto , Tatsuya Toyama , Takeshi Oka , Noritoshi Mishina
DOI:
关键词: Metallurgy 、 Fluorescence 、 Intensity (heat transfer) 、 Layer (electronics) 、 Deposition (law) 、 Oxygen permeability 、 Analytical chemistry 、 Substrate (electronics) 、 Oxygen 、 Materials science 、 Aluminium
摘要: An aluminum oxide deposited film of the invention, comprising a substrate and an deposit layer of which peel strength to in wet state is at least 0.3 N/15mm, has oxygen permeability not more than 40 ml/m 2 ·day·MPa water vapor 4.0 g/ m ·day. The deposition ratio (A/B) fluorescent X-ray intensity (A) kcps (aluminum Kα-ray) oxide deposited (1) fluorescent X-ray (B) kcps (aluminum (2) obtained without feeding is ≤ 0.85.
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