Double layer resist process scheme for metal lift-off with application in inductive heating of microstructures
作者： L. Ouattara , M. Knutzen , S. Keller , M.F. Hansen , A. Boisen
DOI: 10.1016/J.MEE.2009.11.147
关键词: Resist 、 Optoelectronics 、 Induction heating 、 Metallizing 、 Microstructure 、 Chromium 、 Materials science 、 Photolithography 、 Nanotechnology 、 Lift (force) 、 Metal
摘要: We present a new method to define metal electrodes on top of high-aspect-ratio microstructures using standard photolithography equipment and single chromium mask. A lift-off resist (LOR) layer is implemented in an SU-8 process selectively remove at the end processing. In this way, we have successfully defined 75@mm high be used as test structures for measurement temperature increase due inductive heating.
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