Conflict sensitive compaction for resolving phase-shift conflicts in layouts for phase-shifted features
作者： Michael Sanie , Kent Richardson , Yao-Ting Wang , Christophe Pierrat , Shao-Po Wu
DOI:
关键词: Integrated circuit layout 、 Engineering drawing 、 Circuit extraction 、 Design process 、 IC layout editor 、 Physical design 、 Standard cell 、 Engineering 、 Integrated circuit 、 Design layout record
摘要: Techniques for forming a design layout with phase-shifted features, such as an integrated circuit layout, include receiving information about particular phase-shift conflict in first physical layout. The indicates one or more features logically associated the conflict. Then is adjusted based on that to produce second adjustments rearrange unit of collect free space around selected feature With these techniques, needing additional shifters can obtain needed during process making adjustment. so obtained allows fabrication avoid resolve phase conflicts while mask, substantiating printed layer, actual circuit.
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