Polarity-switching top coats enable orientation of sub-10-nm block copolymer domains.

作者: C. M. Bates , T. Seshimo , M. J. Maher , W. J. Durand , J. D. Cushen

DOI: 10.1126/SCIENCE.1226046

关键词: PerpendicularPolarity (physics)Aqueous solutionChemical engineeringMaleic anhydrideLayer (electronics)CopolymerPolymerBlock (telecommunications)Nanotechnology

摘要: Block copolymers (BCPs) must necessarily have high interaction parameters (χ), a fundamental measure of block incompatibility, to self-assemble into sub-10-nanometer features. Unfortunately, χ often results from blocks that disparate interfacial energies, which makes the formation useful thin-film domain orientations challenging. To mitigate forces, polymers composed maleic anhydride and two other components been designed as top coats can be spin-coated basic aqueous solution in ring-opened, acid salt form. When baked, reforms switches polarity create neutral layer enabling BCP feature alignment not possible by thermal annealing alone. Top were applied lamella-forming poly(styrene-block-trimethylsilylstyrene-block-styrene) poly(trimethylsilylstyrene-block-lactide), thermally annealed produce perpendicular features with linewidths 15 9 nanometers, respectively.

参考文章(41)
Hideaki Yokoyama, Edward J. Kramer, Self-Diffusion of Asymmetric Diblock Copolymers with a Spherical Domain Structure Macromolecules. ,vol. 31, pp. 7871- 7876 ,(1998) , 10.1021/MA9805250
Julie N.L. Albert, Thomas H. Epps, Self-assembly of block copolymer thin films Materials Today. ,vol. 13, pp. 24- 33 ,(2010) , 10.1016/S1369-7021(10)70106-1
Cordell M. Hardy, Frank S. Bates, Man-Ho Kim, George D. Wignall, Model ABC triblock copolymers and blends near the order-disorder transition Macromolecules. ,vol. 35, pp. 3189- 3197 ,(2002) , 10.1021/MA0115489
Julia D. Cushen, Christopher M. Bates, Erica L. Rausch, Leon M. Dean, Sunshine X. Zhou, C. Grant Willson, Christopher J. Ellison, Thin Film Self-Assembly of Poly(trimethylsilylstyrene-b-D,L-lactide) with Sub-10 nm Domains Macromolecules. ,vol. 45, pp. 8722- 8728 ,(2012) , 10.1021/MA301238J
Hyo Seon Suh, Huiman Kang, Chi-Chun Liu, Paul F. Nealey, Kookheon Char, Orientation of Block Copolymer Resists on Interlayer Dielectrics with Tunable Surface Energy Macromolecules. ,vol. 43, pp. 461- 466 ,(2010) , 10.1021/MA901987Q
Marvin Y. Paik, Joan K. Bosworth, Detlef-M. Smilges, Evan L. Schwartz, Xavier Andre, Christopher K. Ober, Reversible Morphology Control in Block Copolymer Films via Solvent Vapor Processing: An In Situ GISAXS study. Macromolecules. ,vol. 43, pp. 4253- 4260 ,(2010) , 10.1021/MA902646T
Eugene Helfand, Z. R. Wasserman, Block Copolymer Theory. 4. Narrow Interphase Approximation Macromolecules. ,vol. 9, pp. 879- 888 ,(1976) , 10.1021/MA60054A001
Shengxiang Ji, Chi-Chun Liu, Guoliang Liu, Paul F. Nealey, Molecular transfer printing using block copolymers ACS Nano. ,vol. 4, pp. 599- 609 ,(2009) , 10.1021/NN901342J