Ba{sub 1{minus}x}Sr{sub x}TiO{sub 3} thin film sputter-growth processes and electrical property relationships for high frequency devices

摘要: Precise control of Ba{sub 1{minus}x}Sr{sub x}Ti0{sub 3} (BST) film composition is critical for the production high-quality BST thin films. Specifically, it known that nonstoichiometry greatly affects electrical properties capacitors. The authors are investigating composition-microstructure-electrical property relationships polycrystalline films produced by magnetron sputter-deposition using a single target with Ba/Sr ratio 50/50 and (Ba+Sr)/Ti 1.0. It was determined ratios these could be adjusted from 0.73 to 0.98 changing total (Ar+O{sub 2}) process pressure, while O{sub 2}/Ar did not strongly affect metal ion composition. crystalline quality as well measured dielectric constant, tunability, breakdown voltage have been found dependent on films, especially ratio. discuss impact control, through deposition parameters, capacitors high frequency devices.