PRODUCTION OF TITANIUM OXIDE THIN FILM
作者： Kinoshita Yoshiki , Kamishiro Yoshimasa , Takaoka Yoichi
DOI:
关键词: Magnesium 、 Thin film 、 Chemical engineering 、 Oxide 、 Crystallinity 、 Substrate (electronics) 、 Halide 、 Titanium tetrachloride 、 Titanium oxide 、 Materials science
摘要: PURPOSE:To form a titanium oxide thin film having uniform crystallinity on substrate at low temperature by reacting halide gas with oxygen in plasma generated high-frequency electric discharge. CONSTITUTION:Gas of (e.g. tetrachloride) is made to react discharge single crystal magnesium oxide. A can be formed the this process.
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