Niobium Oxide Thin Films Grown by Atomic Layer Epitaxy
作者： Kaupo Kukli , Mikko Ritala , Markku Leskelä , Reijo Lappalainen
DOI: 10.1002/(SICI)1521-3862(199801)04:01<29::AID-CVDE29>3.0.CO;2-R
关键词: Atomic layer epitaxy 、 Niobium oxide 、 Scanning electron microscope 、 Materials science 、 Carbon film 、 Amorphous solid 、 Epitaxy 、 Atmospheric temperature range 、 Analytical chemistry 、 Thin film 、 Mineralogy
摘要: … of Nb2O5 films by ALE using Nb(OC2H5)5 and H2O as precursors. In addition to the interest in the pure Nb2O5 films, if proper conditions for controlled ALE growth of Nb2O5 could be …
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