Fabrication of a dense array of tall nanostructures over a large sample area with sidewall profile and tip sharpness control
作者： Chang-Hwan Choi , Chang-Jin Kim
DOI: 10.1088/0957-4484/17/21/007
关键词: Deep reactive-ion etching 、 Nanotechnology 、 Etching (microfabrication) 、 Nanoscopic scale 、 Nanolithography 、 Interference lithography 、 Microfluidics 、 Nanoelectronics 、 Fabrication 、 Materials science
摘要: We report a simple but efficient nanofabrication method to create a dense (nanoscale pitch) array of silicon nanostructures (post and grate) of varying height and shape over a large …
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