Ultra high density multilayer sliced grating for EUV and Soft X-rays: Recent Developments

摘要: Author(s): Voronov, Dmitriy L.; Anderson, Erik; Cambie, Rossana; Meyer-Ilse, Julia; Gullikson, Eric M.; Yashchuk, Valeriy; Padmore, Howard; Ahn, Minseung; Chang, Chih-Hao; Heilmann, Ralf; Schattenburg, Mark | Abstract: We report on the recent progress developing diffraction gratings which can potentially provide extremely high spectral resolution of 10E5-10E6 in EUV and soft x-ray photon energy range. Such a grating is fabricated by deposition multilayer substrate blazed (echellette) with relatively low groove density. In order to obtain an oblique cut multilayer, subsequent polish applied coated substrate. The resulting sliced structure has short-scale periodicity defined period slice angle. Based developed technology, number made Sc/Si Mo/Si multilayers deposited echellettes different grove periods were tested. result experiments performed at ALS beam line 6.3.2 range are presented discussed. This work was supported US Department Energy under contract DE-AC02-05CH11231