Principles of Kelvin Probe Force Microscopy
作者： Y. Rosenwaks , Th. Glatzel , M.Ch. Lux-Steiner , E. Strassburg , A. Boag
DOI: 10.1007/978-0-387-28668-6_5
关键词: Microscopy 、 Kelvin probe force microscope 、 Work function 、 Optics 、 Scanning probe microscopy 、 Volta potential 、 Point spread function 、 Resolution (electron density) 、 Materials science 、 Microscope
摘要: In this chapter we describe and discuss Kelvin probe force microscopy (KPFM), a scanning technique designed to obtain laterally resolved work function images by measuring the electrostatic forces between sample surface. By operating microscope in ultrahigh vacuum, even absolute measurements with very high lateral energy resolution can be realized.
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Franz J. Giessibl, Marco Tortonese, Self-oscillating mode for frequency modulation noncontact atomic force microscopy Applied Physics Letters. ,vol. 70, pp. 2529- 2531 ,(1997) , 10.1063/1.118910
S. Hudlet, M. Saint Jean, B. Roulet, J. Berger, C. Guthmann, Electrostatic forces between metallic tip and semiconductor surfaces Journal of Applied Physics. ,vol. 77, pp. 3308- 3314 ,(1995) , 10.1063/1.358616
Th. Glatzel, D. Fuertes Marrón, Th. Schedel-Niedrig, S. Sadewasser, M. Ch. Lux-Steiner, CuGaSe2 solar cell cross section studied by Kelvin probe force microscopy in ultrahigh vacuum Applied Physics Letters. ,vol. 81, pp. 2017- 2019 ,(2002) , 10.1063/1.1506205
A. Chavez‐Pirson, O. Vatel, M. Tanimoto, H. Ando, H. Iwamura, H. Kanbe, Nanometer‐scale imaging of potential profiles in optically excited n‐i‐p‐i heterostructure using Kelvin probe force microscopy Applied Physics Letters. ,vol. 67, pp. 3069- 3071 ,(1995) , 10.1063/1.114867
P. De Wolf, M. Geva, T. Hantschel, W. Vandervorst, R. B. Bylsma, Two-dimensional carrier profiling of InP structures using scanning spreading resistance microscopy Applied Physics Letters. ,vol. 73, pp. 2155- 2157 ,(1998) , 10.1063/1.122408
M. Nonnenmacher, M. P. O’Boyle, H. K. Wickramasinghe, Kelvin probe force microscopy Applied Physics Letters. ,vol. 58, pp. 2921- 2923 ,(1991) , 10.1063/1.105227
S. Saraf, R. Shikler, J. Yang, Y. Rosenwaks, Microscopic surface photovoltage spectroscopy Applied Physics Letters. ,vol. 80, pp. 2586- 2588 ,(2002) , 10.1063/1.1468275
S. Sadewasser, Th. Glatzel, M. Rusu, A. Jäger-Waldau, M. Ch. Lux-Steiner, High-resolution work function imaging of single grains of semiconductor surfaces Applied Physics Letters. ,vol. 80, pp. 2979- 2981 ,(2002) , 10.1063/1.1471375
S. Hudlet, M. Saint Jean, C. Guthmann, J. Berger, Evaluation of the capacitive force between an atomic force microscopy tip and a metallic surface European Physical Journal B. ,vol. 2, pp. 5- 10 ,(1998) , 10.1007/S100510050219
H. O. Jacobs, A. Stemmer, Measuring and modifying the electric surface potential distribution on a nanometre scale : a powerful tool in science and technology Surface and Interface Analysis. ,vol. 27, pp. 361- 367 ,(1999) , 10.1002/(SICI)1096-9918(199905/06)27:5/6<361::AID-SIA482>3.0.CO;2-8