Method for reducing reflectivity of a metal layer
作者： Gregory Joseph Stagaman , Michael Edward Haslam
DOI:
关键词: Materials science 、 Thin oxide 、 Plasma etching 、 Layer (electronics) 、 Analytical chemistry 、 Oxide 、 Optoelectronics 、 Buffer (optical fiber) 、 Metal 、 Reflectivity 、 Photolithography
摘要: A method is provided for reducing the reflectivity of a metal layer prior to photolithography. thin buffer layer, such as oxide, can be deposited over layer. short plasma etch performed in order roughen, but not completely remove, oxide This roughened significantly reduces underlying As an alternative, brief applied directly which results significant roughening its upper surface. also
lens.org 参考文章(19)
Peter R. Denton, Anti-relfection overlay device ,(1986)
Karen M. Abrahamovich, Dean R. Weed, Edward H. Payne, Clifford J. Hamel, Methods of simultaneous contact and metal lithography patterning ,(1981)
Robert M. Duboc, Christopher J. Curtin, Paul A. Lovoi, Ronald S. Nowicki, Theodore S. Fahlen, Structure of light-emitting device with raised black matrix for use in optical devices such as flat-panel cathode-ray tubes ,(1994)
Robert W. Warner, Andrew J. Ouderkirk, Madeline P. Shinbach, Douglas S. Dunn, Heat sealing of semicrystalline quasi-amorphous polymers ,(1988)
Harry W. Deckman, Eli Yablonovitch, Horst Witzke, Christopher Wronski, Method for making optically enhanced thin film photovoltaic device using lithography defined random surfaces ,(1984)
George F. J. Garlick, Process for fabricating a solar energy converter employing a fluorescent wavelength shifter ,(1986)
C. Richard Guarnieri, Radiant energy collector having plasma-textured polyimide exposed surface ,(1982)
Sinji Miyazaki, Yutaka Kamata, Tsunehisa Ueno, Method for patterning layer having high reflectance using photosensitive material ,(1983)
Albert W. Fisher, Patterned metallization for integrated circuits ,(1985)
Tadashi Ootake, Mamoru Soga, Kazufumi Ogawa, Method of manufacturing an adsorbed monomolecular film ,(1993)