PM-04Relationship between amorphous structure and radiation tolerance of silicon oxycarbide

作者： Shoki Mizuguchi , Shinsuke Inoue , Manabu Ishimaru , Qing Su , Michael Nastasi

DOI: 10.1093/JMICRO/DFY100

关键词: Amorphous solid 、 Chemical engineering 、 Radiation tolerance 、 Silicon oxycarbide 、 Materials science