作者: A. Sáenz-Trevizo , P. Amézaga-Madrid , P. Pizá-Ruiz , O. Solís-Canto , C. Ornelas-Gutiérrez
DOI: 10.1016/J.JALLCOM.2014.01.149
关键词: X-ray photoelectron spectroscopy 、 Thin film 、 Scanning electron microscope 、 Oxide 、 Analytical chemistry 、 Substrate (electronics) 、 High-resolution transmission electron microscopy 、 Materials science 、 Chemical vapor deposition 、 Microstructure
摘要: Abstract In this work, it is presented the synthesis, microstructural characterization and photocatalytic properties of bilayered CuO–ZnO/ZnO thin films onto borosilicate glass fused silica substrates. The were deposited by aerosol assisted chemical vapor deposition, using an experimental setup reported elsewhere. Deposition conditions optimized to get high quality films; i.e. they structurally uniform, highly transparent, non-light scattering, homogeneous, well adhered substrate. Different Cu/Zn atomic ratios tried for upper layer. microstructure was characterized grazing incidence X-ray diffraction (GIXRD), scanning electron microscopy (SEM), resolution transmission (HRTEM) photoelectron spectroscopy. GIXRD results indicate presence ZnO Wurzite Cu oxide phases. Results SEM HRTEM analysis cross sectional showed that composed compact dense layers with no visible evidence interfacial boundary or porosity. Optical absorbance a clear shift absorption toward range. band gap determined roughly at 3.2 2 eV oxide, respectively. Photocatalytic activity samples, degradation 10 − 5 mol dm 3 solution methylene blue (MB), after 120 240 min irradiation UV-A source. Around 90% MB reached 50 at.% in Zn–Cu layer buffer film.