Multi-axis retarder arrays by masked oblique deposition
作者： M. D. Arnold , I. J. Hodgkinson , Q. H. Wu , R. J. Blaikie
DOI: 10.1116/1.1993618
关键词: Oblique case 、 Birefringence 、 Coating 、 Masking (art) 、 Azimuth 、 Retarder 、 Physical vapor deposition 、 Optics 、 Materials science 、 Polarimetry
摘要: We report a technique for single-deposition production of arrays with differently oriented nano-structured elements, which we optimize application to form-birefringent retarder arrays. The involves masking oblique physical vapor deposition, manipulating the local availability angles create spatially variant properties in structured coating. have designed variety using symmetry considerations, and constructed selection based on suitability multiplexed complete-Stokes polarimetry. In particular, emphasize square lattice designs two-by-two repeat unit, consisting three retarders azimuths at 0°, 45° 90° zero-retardation element. silicon were tested visible-wavelength transmission techniques confirm success method. Finally, discuss some considerations microlithography, infer lateral resolution limit related coating...
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