Method of cleaning of an electrostatic chuck in plasma reactors
作者： Richard Muh , Yuh-Jia Su
DOI:
关键词: Debye sheath 、 Pedestal 、 Materials science 、 Particulates 、 Engineering drawing 、 Metallurgy 、 Plasma 、 Semiconductor
摘要: The present invention provides a method for removing particulate contaminants from an electrostatic chuck pedestal semiconductor workpiece by physical removal employing soft material or creating plasma sheath which suspends the surface and entrains them in gas stream of chamber vacuum exhaust system chamber. contaminant processes are particularly effective continuous treatment workpieces.
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