Analysis of multifunctional titanium oxycarbide films as a function of oxygen addition
作者： J.M. Chappé , A.C. Fernandes , C. Moura , E. Alves , N.P. Barradas
DOI: 10.1016/J.SURFCOAT.2011.11.005
关键词: Materials science 、 Limiting oxygen concentration 、 X-ray photoelectron spectroscopy 、 Partial pressure 、 Sputtering 、 Titanium 、 Oxygen 、 Analytical chemistry 、 Thin film 、 Spectroscopy 、 Materials Chemistry 、 General chemistry 、 Surfaces, Coatings and Films 、 Surfaces and Interfaces 、 Condensed matter physics
摘要: Abstract Reactive magnetron sputtering was used to deposit titanium oxycarbide thin films. The overall set of results showed that the oxygen flow rate, and thus composition atmosphere in deposition chamber, controls films obtained by reactive sputtering. Rutherford Backscattering Spectroscopy analysis revealed existence three major types films, indexed their particular ratios. A detailed study X-ray photoelectron spectroscopy carried out order characterize evolution Ti C, C O bonds induced increase partial pressure, which found be closely related with different zones were suggested. Micro-Raman diffraction measurements allowed describing complex nature film structure, namely what concerns phases evolution, texture phenomena grain size as a function (different zones). Electrical conductivity transition from metallic semi-conducting behavior concentration good agreement Similarly, optical properties supported this gradual change for contents higher than 67 at.%, exhibited typical reflectance insulator materials (interferences) UV, visible near IR regions.
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