作者: Roger Kelly , Antonio Miotello
DOI: 10.1007/978-94-011-0077-9_3
关键词: Group (periodic table) 、 Work (thermodynamics) 、 Molecular physics 、 Thermal 、 Sputtering 、 Mixing (physics) 、 Ion 、 Materials science 、 Ion beam mixing 、 Residual
摘要: It is our intent in what follows to describe a group of ion-surface interactions, namely sputtering, mixing, and composition change. In so doing we will discover that the underlying mechanisms are related surprising extent. Thus one recognize two categories ballistic effect, tentative thermal-spike effects, effects due randomly moving residual defects (previously grouped slow thermal electronic [1.1]), chemically guided defects, [1.1,1.2]. These correspondences outlined Table 1, where note also which not be described here. Also noted corresponding laser-surface although consider these explicitly present work.