Eddy current sensor
作者： Mitsuo Tada , Yasunari Suto
DOI:
关键词: Eddy current 、 Eddy-current sensor 、 Wafer 、 Acoustics 、 Electrical engineering 、 Signal 、 Magnetic flux 、 Signal source 、 Materials science 、 Electromagnetic coil 、 Electrical conductor
摘要: An eddy current sensor (10) has a coil (100) disposed near conductive film (6) formed on semiconductor wafer (W) and signal source (124) configured to supply an AC the produce in (6). The includes detection circuit operable detect produced is connected (100). also housing (200) made of material having high magnetic permeability. accommodates therein. so that forms path flux (MF) as effectively
lens.org 参考文章(47)
Richard G. McClelland, Method for measuring crud thickness on nuclear fuel rods ,(1999)
Tetsuji Togawa, Mitsuo Tada, Yasunari Suto, Koichi Fukaya, Taro Takahashi, Substrate polishing apparatus and substrate polishing method ,(2004)
Leonid Velikov, Yuri Vorobyev, Boris Kesil, Method and apparatus for measuring thickness of thin films with improved accuracy ,(2003)
Tim Danielson, Multi-Parameter eddy current measuring system with parameter compensation technical field ,(1995)
Mitsuo Tada, Hironobu Yamasaki, Yasunari Suto, Frequency measuring device, polishing device using the same and eddy current sensor ,(2001)
Steven G. Barbee, Arnold Halperin, Leping Li, Endpoint detection for chemical mechanical polishing using frequency or amplitude mode ,(1997)
Yuichiro Yamazaki, Tetsuo Matsuda, Motosuke Miyoshi, Osamu Nagano, Hisashi Kaneko, Eddy current loss measuring sensor, thickness measuring system, thickness measuring method, and recorded medium ,(2001)
Manoocher Birang, Boguslaw A. Swedek, Polishing pads useful for endpoint detection in chemical mechanical polishing ,(2002)
Eric Strauts, Coin discrimination sensor and coin handling system ,(1996)