作者: P.A. Cox , R.G. Egdell , P.D. Naylor
DOI: 10.1016/0368-2048(83)80069-3
关键词: Bending 、 Analytical chemistry 、 Polar 、 Surface phonon 、 Adsorption 、 Etching (microfabrication) 、 Atomic physics 、 Chemistry 、 Argon 、 Ion 、 Substrate (electronics)
摘要: Abstract The adsorption of water on SrTiO 3 (100) has been studied by HREELS. Exposure the defect free surface to at 100K leads initially non-dissociative cation sites with development losses due OH stretching and bending modes frequencies similar those H 2 O. Further exposure results in progressive attenuation phonon substrate a loss spectrum characteristic an ice multilayer. Binding oxygen vacancy generated argon ion etching is much stronger than surface.