Characterization of Cured Width under Wide Range of Gaussian Laser Exposure for Bulk Lithography
作者： Kiran S Bhole , Prasanna S Gandhi , T Kundu , None
DOI: 10.1016/J.MSPRO.2014.07.500
关键词: Surface roughness 、 Laser exposure 、 Microstructure 、 Materials science 、 Range (particle radiation) 、 Characterization (materials science) 、 Optics 、 Lithography 、 Beer–Lambert law 、 Gaussian
摘要: Abstract Determination of cured width is an important consideration especially for controlling the surface roughness free down-facing three dimensional (3D) microstructure in ‘Bulk Lithography’ process. Classical Beer Lambert's law used predicting photopolymerized width. However, experimental investigation reveals that limited to predict only small range energy dose resulting from smaller duration exposure. This paper presents first results and then proposes enhanced semi-empirical model applicable wide laser exposure duration.
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