Atomic Force Microscope Based Lithography of YBa2Cu3O7-δThin Films

摘要: We demonstrate the patterning of controlled, arbitrary structures into surface thin film YBa2Cu3O7-δ samples by application a bias voltage between sample and tip an atomic force microscope operated in contact mode, programmed to trace out desired structure. The modified volume, as observed above surface, is shown increase linearly with applied voltage, beyond some threshold value, suggesting electrochemical anodisation process, while increasing scan speed results decrease but apparent improvement homogeneity. Energy dispersive X-ray measurements support scenario oxidation means modification, current flow region indicate that it insulating, offering potential technique fabrication superconducting device elements.