Stiction in surface micromachining
作者： Niels Tas , Tonny Sonnenberg , Henri Jansen , Rob Legtenberg , Miko Elwenspoek
DOI: 10.1088/0960-1317/6/4/005
关键词: Contact area 、 Nanotechnology 、 Surface roughness 、 van der Waals force 、 Composite material 、 Surface micromachining 、 Capillary condensation 、 Materials science 、 Capillary action 、 Stiction 、 Adhesion 、 Mechanical engineering 、 Electrical and Electronic Engineering 、 Mechanics of Materials 、 Electronic, Optical and Magnetic Materials
摘要: … Silicon dioxide can be removed by etching in HF vapor [27]. … These hemispherical bumps reduce the contact area to … Next, the silicon nitride is etched anistropically in RIE, leaving it on …
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