作者: B.J. Bowles
DOI: 10.1016/0013-4686(65)80038-X
关键词: Monolayer 、 Thallium 、 Ion 、 Adsorption 、 Chemistry 、 Saturation (chemistry) 、 Platinum 、 Inorganic chemistry 、 Electrode 、 Metal
摘要: Abstract The specific adsorption of thallous ion on to platinum at controlled potential from very dilute solutions in 0·1 M HCl has been studied by means a radioactive tracer technique. It is shown that up monolayer thallium takes place potentials far removed the for bulk deposition metal, and two different mechanisms appear be present. An explanation advanced change apparent saturation surface coverage with applied potential. integral coefficient presented as function coverage.