作者: Yoshiharu Honjo , Hidenori Watanabe , Takuya Makino , Hiroichi Ishikawa
DOI:
关键词: Etching (microfabrication) 、 Substrate (printing) 、 Interference phenomenon 、 Image display 、 Optical thin film 、 Optics 、 Materials science 、 Layer (electronics) 、 Process (computing) 、 Electrical conductor
摘要: An optical multilayer structure material has a such that, on substrate, conductive layer in contact with the gap portion having size that enables an interference phenomenon to occur and can be changed, thin film are formed this order. The circumference of movable is uniformly supported by supporting portions, suppressing generation strain due internal stress. Through holes allow etchant easily reach sacrifice when forming etching for layer. There provided simple construction, which suppress stress advantageously used image display apparatus.