作者: M. A. R. Saidin , M. Aziz , A. F. Ismail , Mohamad Rusop , Tetsuo Soga
DOI: 10.1063/1.3160134
关键词: Chemical vapor deposition 、 Nanotechnology 、 Carbon nanotube supported catalyst 、 Materials science 、 Chemical engineering 、 Catalysis 、 Thin film 、 Sputtering 、 Particle size 、 Carbon nanotube 、 Nickel
摘要: The thickness and morphology of the catalyst film significantly affect properties carbon nanotubes (CNTs). size shape are key factors for controlling CNT diameter. Therefore, objectives this study to develop a thin CNTs growth application by varying time deposition investigate effect radio frequency (rf) plasma power. was developed using physical sputtering method with an rf power between 20 100 watt at nickel as catalyst. Ni/Cr in fabricated on corning glass substrates. obtained 12 nm surface profiler characterized field emission scanning electron microscopy (FESEM) atomic force (AFM) determine morphologies particle It observed that structural Ni is influenced time.