Metal diffraction array with high reflection resistance to a femtosecond mode flow, system including such an array, and method for improving the damage threshold of a metal diffraction array
作者： Frédéric Desserouer
DOI:
关键词: Substrate (electronics) 、 Diffraction 、 Diffraction efficiency 、 Optics 、 Dielectric 、 Thin film 、 Materials science 、 Femtosecond 、 Laser 、 Layer (electronics)
摘要: The invention relates to a reflection metal diffraction array (6) having high efficiency for diffracting femtosecond mode laser pulses, said including substrate (2) with set of lines (1) pitch Λ, being made or covered layer (21), and (8) thin film (4) dielectric material thickness e, covering the surface (12) array, capable receiving pulsed electromagnetic light wave in mode. According invention, e is lower than 50 nm, reducing by third order factor at least maximum square electric field on (2, 2') as compared (5) not film, improve flow resistance also pulse compressor that comprises such an method improving damage threshold
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