作者: Kang Ho Ahn , Benjamin Y.H. Liu
DOI:
关键词: Dissolution 、 Pressure vessel 、 Particle 、 Liquid bubble 、 Chemistry 、 Chromatography 、 Layer (electronics) 、 Relief valve 、 High pressure 、 Composite material 、 Chamber pressure
摘要: This invention provides methods and apparatus for removing contaminant particles from a surface of an article (113). In one embodiment, (120) to be cleaned is immersed in cleaning liquid (117) pressure vessel chamber (115) dissolving gas (119) dissolved into the at high pressure. A relief valve (123) then suddenly opened, bubbles spontaneously form liquid, contaminants are dislodged (113) carried toward by bubbles. small amount containing can further caused thin frozen layer on submerged cleaned, before dropped suddenly, causing spontaneous bubble formation that moves away cleaned. The or removed surface.