Particle removal from surfaces by pressure change

作者: Kang Ho Ahn , Benjamin Y.H. Liu

DOI:

关键词: DissolutionPressure vesselParticleLiquid bubbleChemistryChromatographyLayer (electronics)Relief valveHigh pressureComposite materialChamber pressure

摘要: This invention provides methods and apparatus for removing contaminant particles from a surface of an article (113). In one embodiment, (120) to be cleaned is immersed in cleaning liquid (117) pressure vessel chamber (115) dissolving gas (119) dissolved into the at high pressure. A relief valve (123) then suddenly opened, bubbles spontaneously form liquid, contaminants are dislodged (113) carried toward by bubbles. small amount containing can further caused thin frozen layer on submerged cleaned, before dropped suddenly, causing spontaneous bubble formation that moves away cleaned. The or removed surface.

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