Electrochemical Epitaxial Growth, Structure, and Electrocatalytic Properties of Noble Metal Thin Films on Au(111) and Au(100)

作者: Kohei Uosaki , Shen Ye , Toshihiro Kondo , Hideo Naohara

DOI: 10.1007/978-1-4615-0775-8_2

关键词: Noble metalMetalorganic vapour phase epitaxyChemical vapor depositionLayer (electronics)Deposition (phase transition)NanotechnologyEpitaxyThin filmMolecular beam epitaxyMaterials science

摘要: It is well-known that the physical and chemical properties of an ultra thin metal layer on a foreign substrate are different from those bulk metal.1,2 The establishment preparation method with ordered structure understanding origin its unique very important both for fundamental science industrial applications. epitaxial growth well-defined metals has been achieved by vapor deposition, molecular beam epitaxy (MBE), metalorganic deposition (MOCVD) under condition.3,4 Compared to these techniques in vacuum, electrochemical economical easy because expensive vacuum equipments not necessary deposition. Unfortunately, however, quality electrodeposited layers usually low. Recent development electrochemistry single crystal electrode situ surface characterization such as scanning tunneling microscopy (STM) X-ray scattering (SXS) atomic resolution make control possible.5

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