Gas mixture supplying method and apparatus
作者： Yohei Uchida , Takahiro Yamamoto
DOI:
关键词: High flow rate 、 Separator (oil production) 、 Waste management 、 Gas supply 、 Petroleum engineering 、 Volumetric flow rate 、 Chemistry
摘要: A gas mixture supplying method includes plural kinds of gases through supply lines connected to a common pipeline and the from outlet region where is used line. When two or more having different flow rates are supplied simultaneously, relatively low rate one provided at position closer than that for high rate.
lens.org 参考文章(35)
James McAndrew, Eric Duchateau, Alan Zdunek, Jean-Marc Girard, Gas delivery apparatus and method for monitoring a gas phase species therein ,(2002)
Satoshi Kagatsume, Yukio Minami, Nobukazu Ikeda, Manohar L. Shrestha, Backflow prevention apparatus for feeding a mixture of gases ,(1997)
Ichiro Yokoyama, Hiroshi Nishizato, Jun Zhao, Visweswaren Sivaramakrishnam, Vaporization sequence for multiple liquid precursors used in semiconductor thin film applications ,(1994)
Daniel Alexander Smith, Ali Shajii, External volume insensitive flow verification ,(2005)
Jed E. Rose, Smoking of regenerated tobacco smoke ,(1986)
Xiao-Dong Xiang, Daesig Kim, Sohrab Erfanian, Young K. Yoo, Yi-Qun Li, Production of nano-powder based combinatorial libraries ,(2005)
Robin A. Gardiner, Peter S. Kirlin, Duncan W. Brown, Method of forming a superconducting oxide layer by MOCVD ,(1992)
Victor Emerald Hauser, Richard Siegfried Wagner, Frank Bernard Alexander, Cesar Deduyo Capio, Ashok Kumar Sinha, Hyman Joseph Levinstein, Cyril Joseph Mogab, Radial flow reactor including glow discharge limitting shield ,(1978)
Hiroshi Nishizato, Hirofumi Ono, Makoto Nagashima, Chemical vapor deposition method and apparatus therefore ,(1994)